
Ion beam analysis facilities
The key instrument of the group is 1.7 MV Pelletron accelerator which was donated by Technical Research Centre of Finland in 2006. It is actively used for ion beam analysis and ion beam lithography. At the present the available energy range starts from <200 keV for H, He and O, and goes up close to 15 MeV for multiply charged heavy ions ions. We currently have 4 active beam-lines; one for Rutherford Backscattering Spectrometry (RBS), a short beam line for particle induced X-ray emission (PIXE) studies together with RBS, one for ion beam lithography and the newest is the ToF-ERDA beamline. The ToF-ERDA analysis software Potku is also developed by the group.
A key part of the work of the group is to train students on applications of accelerators in materials science and technology. This is done by supervising of masters projects and course work.