Pelletron-lineaarikiihdytintä käytetään esimerkiksi ohutkalvojen alkuainejakaumien mittaamiseen. Kuva: Jyväskylän yliopisto

Ion beam analysis facilities

The ion beam analysis research offers high quality capabilities in materials analysis and fabrication. An essential part of the work of the group is also to train students on applications of accelerators in materials science and technology.

Ion beam analysis facilities is located in the Accelerator Laboratory and operated by Accelerator based materials research group.  The ion beam analysis research offers high quality capabilities in materials analysis and fabrication.  An essential part of the work of the group is also to train students on applications of accelerators in materials science and technology. The group uses MeV ion beams from Pelletron to probe the elemental compositional and structural properties of materials, keV beams from helium ion microscope (HIM) and does atomic layer deposition (ALD) with state-of-the-art equipment. Access to ion beam analysis and helium ion microscopy at JYFL is supported for eligible external research teams via EU H2020 project .

Pelletron accelerator with specified beam lines

The key instrument of the group is 1.7 MV Pelletron accelerator which was donated by Technical Research Centre of Finland in 2006. It is actively used for ion beam analysis and ion beam lithography. At the present the available energy range starts from <200 keV for H, He and O, and goes up close to 15 MeV for multiply charged heavy ions ions. We currently have 4 active beam-lines; one for Rutherford Backscattering Spectrometry (RBS), a short beam line for particle induced X-ray emission (PIXE) studies together with RBS, one for ion beam lithography and the newest is the ToF-ERDA beamline. The ToF-ERDA analysis software Potku is also developed by the group.

A key part of the work of the group is to train students on applications of accelerators in materials science and technology. This is done by supervising of masters projects and course work.

See also