FYSS5455 Electron, Photon and Ion Beam Methods in Materials Science (5 cr)
Learning outcomes
The course is a thorough package of modern materials research techniques, focusing to those ones we have available here in Jyv盲skyl盲. It is useful for nanoscientists as well as for student specializing in materials or nuclear physics. It is also well suited for a chemist specializing in materials research. At the end of this course, students will be able to explain the fundamentals of different thin film deposition techniques and describe the fundamentals, possibilities and limitations of different thin film analysis techniques and detectors used in these techniques. Students will be able to select the most useful technique for each analysis problem, perform ion beam analysis measurements under supervision and do independent analysis of the measured data and perform measurements with at least one non-accelerator based analysis technique.
Study methods
Assignments, project work, examination.
Content
Interaction of energetic ions, electrons and photons with matter; thin film deposition techniques; ion, electron and photon beam based characterization techniques for thin films and surfaces; project work, which consists of growth of thin films using atomic layer deposition, characterization of thin films using at least two different techniques, reporting performed analysis and presenting results in a seminar.
Further information
Given on autumn semester 1st period, every two years starting autumn 2017.
Assessment criteria
The final grade is based on final exam (60 %), home exercises (20 %) and project work (20 %).
Prerequisites
It is recommended that students enrolling to the course have completed a course in Measurements Techniques and Systems (FYSS6310) or a similar course.