FYSS6335 Micro- and Nanofabrication (7 cr)
Learning outcomes
At the end of this course, students will be able to create a micro- or nanofabrication process from scratch and evaluate theoretically the outcome of different fabrication processes.
Study methods
Examination, assignments, laboratory work
Content
Development of the silicon planar process and lithography; thin films: Materials, general properties and characterization; deposition methods (Physical & chemical vapor deposition); etching methods (Dry, wet, plasma); doping methods (Diffusion & Ion implantation); nanoimprint lithography and self-assembly -based methods; state-of-the-art in microfabrication; the nanotechnology frontier
Further information
Given on spring semester 2nd period, every two years starting spring 2018.
Materials
Lecture notes, website(s), articles, etc.
Literature:
| ISBN-number | Author, year of publication, title, publisher |
|---|---|
| 978-0-470-85105-0 | Sami Franssila, "Introduction to microfabrication", Wiley, 2004, ISBN: 978-0-470-85105-0 |
| 9780849308260 | Marc J. Madou, "Fundamentals of Microfabrication: The Science of Miniaturization", CRC press, 2002. ISBN: 9780849308260 |
| 978-0-306-44146-2 | Brodie, Ivor, Muray, Julius J. "The Physics of Micro/Nano-Fabrication" Plenum 1993. ISBN: 978-0-306-44146-2 |
Assessment criteria
Active participation to the course events is expected. The final grade is based on examination (70 %), assignments (15 %) and laboratory work (15 %). To pass the course students need to have a final score of 50 %.
Prerequisites
Before enrolling for this course, students are expected to have studied the Experimental Methods in Physics (FYSA1110).