FYSS6330 Microscopy and Lithography (7 cr)
Learning outcomes
At the end of this course, students will be able to select appropriate imaging method for different samples and conditions. They will also be able to evaluate what lithography method is suitable for different patterning conditions.
Study methods
Examination, assignments, written assignments
Content
Basic imaging science; optical-, electron-, ion-, and scanning probe microscopy; near-field optical microscopy; basics of micro- and nanolithography; photolithography; electron and ion beam lithography; scanning probe lithography
Further information
Given on spring semester 2nd period, every two years starting spring 2019.
Materials
Lecture notes, website(s), articles, etc.
Literature:
| ISBN-number | Author, year of publication, title, publisher |
|---|---|
| Eugene Hecht, 鈥淥ptics鈥� 5th Ed, Maddison-Wesley, 2002 | |
| Chris Mack, 鈥淔undamental Principles of Optical Lithography鈥�, Wiley |
Assessment criteria
Active participation to the course events is expected. The final grade is based on examination (70 %), assignments (15 %) and written assignments (15 %). To pass the course students need to have a final score of 50 %.