FYSS6330 Mikroskopia ja litografia (7 op)

Arvosteluasteikko
0-5
Opetuskieli/-kielet
englanti

Osaamistavoitteet

At the end of this course, students will be able to select appropriate imaging method for different samples and conditions. They will also be able to evaluate what lithography method is suitable for different patterning conditions.

Suoritustavat

Examination, assignments, written assignments

厂颈蝉盲濒迟枚

Basic imaging science; optical-, electron-, ion-, and scanning probe microscopy; near-field optical microscopy; basics of micro- and nanolithography; photolithography; electron and ion beam lithography; scanning probe lithography

尝颈蝉盲迟颈别诲辞迟

Given on spring semester 2nd period, every two years starting spring 2019.

Oppimateriaalit

Lecture notes, website(s), articles, etc.

Kirjallisuus

ISBN-numero Tekij盲, julkaisuvuosi, teoksen nimi, julkaisija
Eugene Hecht, 鈥淥ptics鈥� 5th Ed, Maddison-Wesley, 2002
Chris Mack, 鈥淔undamental Principles of Optical Lithography鈥�, Wiley

Arviointiperusteet

Active participation to the course events is expected. The final grade is based on examination (70 %), assignments (15 %) and written assignments (15 %). To pass the course students need to have a final score of 50 %.